The atomic layer deposition (ALD) of silicon nitride thin films is an advanced technique that utilises sequential, self-limiting reactions to produce high‐quality, conformal coatings with ...

Analysis of the crystal structure at DESY’s X-ray light source PETRA III showed that the silicon nitride had completely transformed into the cubic phase. “The transformation is similar to carbon that ...

A collaboration of scientists led by researchers with the U.S. Department of Energy's Lawrence Berkeley National Laboratory (Berkeley Lab) has uncovered clues at the atomic level that could lead ...

Silicon nitride ceramics are considered to be an ideal matrix for preparing metamaterials due to their high insulation, high thermal conductivity, high temperature resistance, corrosion resistance ...

Shining potential of missing atoms Single-atom vacancies in atomically thin insulators created in ultra-high vacuum Date: June 14, 2023 Source: University of Vienna ...

Amorphous silicon monoxide is known to undergo disproportionation to silicon- and silicon dioxide-like regions, however direct observation of the atomic-scale heterogeneity is still missing. Here ...

The use of the soft substrate hexagonal boron nitride reduces damage to the atomic structure caused by strain, allowing materials to keep their conductive properties as films as thin as 12 nm ...

Electromagnetic metamaterials with negative physical parameters such as negative dielectric constant and negative magnetic permeability have attracted widespread attention in the academic ...